2026 Summer - ALD Process Development Engineer Intern - MS/PhD (Detroit, MI)

Applied Materials is hiring an MS/PhD intern to support ALD thin‑film process development and characterization at its Wayne State University facility in Detroit.

Experience with vapor phase deposition techniques, preferably atomic layer deposition (ALD), Proficiency in electron microscopy and film characterization (e.g., XPS, XRD, XRF, TEM, SEM, FTIR), Hands‑on experience operating lab deposition equipment and characterization instruments, Data analysis skills to interpret experimental results, Strong written and oral communication for reporting and presentations, Ability to troubleshoot process hardware and experimental setups